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12-89 (technical revision)
The decomposition of silicon oxide on silicon wafer
supported by the EtherCAT Technology Group (ETG)
SEMI MF1530-0707 (technical revision)
S02500 - SEMI S25 - Safety Guideline for Hydrogen Peroxide Storage & Handling Systems Lang-Chinese (Simplified) 12-89 (technical revision)The purpose of this Safety Guideline is to set out the minimum safety and health criteria to be applied to equipment and systems for storage and handling of hydrogen peroxide in the semiconductor and flat panel display industries. This Safety Guideline addresses concentrations of hydrogen peroxide (H2O2) commonly used in the semiconductor and FPD industries (i. e., concentrations below 40% w w). This Safety Guideline is focused on the storage,
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